Reduction of image placement errors in EPL masks (Invited Paper)

Reduction of image placement errors in EPL masks (Invited Paper)

著者名:

II, O.R.W. ( International SEMATECH (USA) )

Reu, P.L. ( Univ. of Wisconsin/Madison (USA) )

Engelstad, R.L. ( Univ. of Wisconsin/Madison (USA) )

Lovell, E.G. ( Univ. of Wisconsin/Madison (USA) )

Lercel, M.J. ( IBM Microelectronics Div. (USA) )

Thiel, C.W. ( IBM Microelectronics Div. (USA) )

Lawliss, M.S. ( IBM Microelectronics Div. (USA) )

Mackay, R.S. ( Photronics, Inc. (USA) )

さらに 3 件

掲載資料名:

Emerging Lithographic Technologies VII

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5037

発行年:

2003

巻:

1

パート:

Session 14

開始ページ:

521

終了ページ:

530

総ページ数:

10

出版情報:

Bellingham, WA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819448422 [0819448427]

言語:

英語

請求記号:

P63600/5037

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013023
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Emerging Lithographic Technologies
回次:	2003 : 7th
会議開催地:	Santa Clara, California, USA
会議開催年:	2003.02.25-2003.02.27
論文注記:	Session 14. Electron Projection Lithography I ; 5037-67

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2 国際会議録 Ultrathin-membrane EPL masks (Invited Paper) Greschner, J., Bayer, T., Kalt, S., Weiss, H., Reu, P.L., Engelstad, R.L., Wood II, O.R., Thiel, C.M., Gordon, M.S., … SPIE-The International Society for Optical Engineering	8 国際会議録 Image placement distortions in EPI masks Thiel, C.W., Kindt, L., Lawliss, M. SPIE-The International Society for Optical Engineering
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6 国際会議録 Vibrational analysis of 200-mm EPL masks Mikkelson,A.R., Chen,C., Engelstad,R.L., Lovell,E.G. SPIE-The International Society for Optical Engineering	12 国際会議録 Predicting image placement accuracy of x-ray masks Dicks, G.A., Engelstad, R.L., Lovell, E.G., Boerger, B.E., Fleming, D.J., Brown, K.H. SPIE - The International Society of Optical Engineering

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