Estimated impact of shot noise in extreme-ultraviolet lithography

Estimated impact of shot noise in extreme-ultraviolet lithography

著者名:

Cobb, J.L. ( Motorola, Inc. (USA) )
Houle, F.A. ( IBM Almaden Research Ctr. (USA) )
Gallatin, G.M. ( IBM Thomas J. Watson Research Ctr. (USA) )

掲載資料名:

Emerging Lithographic Technologies VII

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5037

発行年:

2003

巻:

1

パート:

Session 11

開始ページ:

397

終了ページ:

405

総ページ数:

9

出版情報:

Bellingham, WA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819448422 [0819448427]

言語:

英語

請求記号:

P63600/5037

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013023
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Emerging Lithographic Technologies
回次:	2003 : 7th
会議開催地:	Santa Clara, California, USA
会議開催年:	2003.02.25-2003.02.27
論文注記:	Session 11. Emerging Resist Technology ; 5037-52

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