Rigorous EM simulation of the influence of the structure of mask patterns on EUVL imaging

Rigorous EM simulation of the influence of the structure of mask patterns on EUVL imaging

著者名:

Deng, Y. ( Univ. of California/Berkeley (USA) )
Fontaine, B.M.L. ( Advanced Micro Devices, Inc. (USA) )
Levinson, H.J. ( Advanced Micro Devices, Inc. (USA) )
Neureuther, A.R. ( Univ. of California/Berkeley (USA) )

掲載資料名:

Emerging Lithographic Technologies VII

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5037

発行年:

2003

巻:

1

パート:

Session 9

開始ページ:

302

終了ページ:

313

総ページ数:

12

出版情報:

Bellingham, WA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819448422 [0819448427]

言語:

英語

請求記号:

P63600/5037

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013023
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Emerging Lithographic Technologies
回次:	2003 : 7th
会議開催地:	Santa Clara, California, USA
会議開催年:	2003.02.25-2003.02.27
論文注記:	Session 9. Advanced Masks I ; 5037-41

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