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Implementing flare compensation for EUV masks through localized mask CD resizing

著者名:
Krautschik, C.G. ( Association of Super-Advanced Electronics Technology (Japan) )
Chandhok, M. ( Intel Corp. (USA) )
Zhang, G. ( Intel Corp. (USA) )
Lee, S.H. ( Intel Corp. (USA) )
Goldstein, M. ( Intel Corp. (USA) )
Panning, E.M. ( Intel Corp. (USA) )
Rice, B.J. ( Intel Corp. (USA) )
Bristol, R.L. ( Intel Corp. (USA) )
Singh, V. ( Intel Corp. (USA) )
さらに 4 件
掲載資料名:
Emerging Lithographic Technologies VII
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5037
発行年:
2003
巻:
1
パート:
Session 2
開始ページ:
58
終了ページ:
68
総ページ数:
11
出版情報:
Bellingham, WA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448422 [0819448427]
言語:
英語
請求記号:
P63600/5037
資料種別:
国際会議録

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