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Comparative analysis of advanced poly-silicon thin-film transistor architectures for drain field relief (Invited Paper)

著者名:
Fortunato, G. ( IFN-CNR (Italy) )
Valletta, A. ( IFN-CNR (Italy) )
Bonfiglietti, A. ( IFN-CNR (Italy) )
Cuscuna, M. ( IFM-CNR (Italy) )
Gaucci, P. ( IFN-CNR (Italy) )
Mariucci, L. ( IFN-CNR (Italy) )
Pecora, A. ( IFN-CNR (Italy) )
Brotherton, S.D. ( Philips Research Labs. (United Kingdom) )
Ayres, J.R. ( Philips Research Labs. (United Kingdom) )
さらに 4 件
掲載資料名:
Poly-Silicon Thin Film Transistor Technology and Applications in Displays and Other Novel Technology Areas
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5004
発行年:
2003
開始ページ:
150
終了ページ:
164
総ページ数:
15
出版情報:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448040 [0819448044]
言語:
英語
請求記号:
P63600/5004
資料種別:
国際会議録

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