TFT threshold voltage adjustment with in-situ doped PVD silicon films
- 著者名:
- Droes, S.R.T. ( Sharp Labs. of America (USA) )
- Atkinson, M.M. ( Sharp Labs. of America (USA) )
- Guthrie, P.R. ( Sharp Labs. of America (USA) )
- Crowder, M.A. ( Sharp Labs. of America (USA) )
- Voutsas, A.T. ( Sharp Labs. of America (USA) )
- 掲載資料名:
- Poly-Silicon Thin Film Transistor Technology and Applications in Displays and Other Novel Technology Areas
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5004
- 発行年:
- 2003
- 開始ページ:
- 95
- 終了ページ:
- 104
- 総ページ数:
- 10
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819448040 [0819448044]
- 言語:
- 英語
- 請求記号:
- P63600/5004
- 資料種別:
- 国際会議録
類似資料:
SPIE-The International Society for Optical Engineering |
MRS - Materials Research Society |
2
国際会議録
Low-temperature processing of SiO2 thin films by HD-PECVD technique for gate dielectric applications
SPIE-The International Society for Optical Engineering |
Electrochemical Society |
SPIE-The International Society for Optical Engineering |
Electrochemical Society |
Electrochemical Society |
Materials Research Society |
Materials Research Society |
11
国際会議録
Nucleation and Grain Growth in Silicon Films Deposited by Thermal Decomposition of Disilane
Trans Tech Publications |
Electrochemical Society |
Electrochemical Society |