Effect of Annealing at High Hydrostatic Pressure of Silicon Implanted with Helium and Oxygen
- 著者名:
Misiuk, A. Katcki, J. Ratajczak, J. Raineri, V. Bak-Misiuk, J. Gawlik, L. Bryja, L. Jun, J. - 掲載資料名:
- Atomistic aspects of epitaxial growth
- シリーズ名:
- NATO science series. Series 2, Mathematics, physics and chemistry
- シリーズ巻号:
- 65
- 発行年:
- 2002
- 開始ページ:
- 457
- 終了ページ:
- 466
- 総ページ数:
- 10
- 出版情報:
- Dordrecht: Kluwer Academic Publishers
- ISBN:
- 9781402006746 [1402006748]
- 言語:
- 英語
- 請求記号:
- N17050/65
- 資料種別:
- 国際会議録
類似資料:
1
国際会議録
Impact of hydrostatic pressure during annealing of Si:O on creation of SIMOX-like structures
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SPIE-The International Society for Optical Engineering |
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