X-ray Study of Strain Relaxation in Heteroepitaxial Layers of Semiconductors Annealed under High Hydrostatic Pressure
- 著者名:
- Bak-Misiuk, J.
- 掲載資料名:
- Frontiers of high pressure research II: application of high pressure to low-dimensional novel electronic materials
- シリーズ名:
- NATO science series. Series 2, Mathematics, physics and chemistry
- シリーズ巻号:
- 48
- 発行年:
- 2001
- 開始ページ:
- 263
- 終了ページ:
- 274
- 総ページ数:
- 12
- 出版情報:
- Dordrecht: Kluwer Academic Publishers
- ISBN:
- 9781402001598 [1402001592]
- 言語:
- 英語
- 請求記号:
- N17050/48
- 資料種別:
- 国際会議録
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