An Etch Back Technique to Achieve Sub-Micron T-Gate for GaAs FETs Using 1-Line Stepper and Phase Shift Mask (PSM)
- 著者名:
- 掲載資料名:
- Proceedings of the Eleventh International Workshop on the Physics of Semiconductor Devices : (December 11-15, 2001)
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 4746
- 発行年:
- 2002
- 巻:
- VOL-2
- 開始ページ:
- 1437
- 終了ページ:
- 1439
- 総ページ数:
- 3
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819445001 [0819445002]
- 言語:
- 英語
- 請求記号:
- P63600/4746
- 資料種別:
- 国際会議録
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