Simulation of optical lithography proces for fabricating diffractive optics

Simulation of optical lithography proces for fabricating diffractive optics

著者名:

Xiao, X. ( Sichuan Univ. (China) )
Yang, J.
Du, J.L.
Guo, Y.K.
Du, C.L. ( Institute of Optics and Electronics (China) )

掲載資料名:

Holography, diffractive optics, and applications : 15-17 October 2002, Shanghai, China

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4924

発行年:

2002

開始ページ:

221

終了ページ:

227

総ページ数:

7

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819447135 [0819447137]

言語:

英語

請求記号:

P63600/4924

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00012773
シリーズID:	PA00000029
会議名:	Photonics Asia : Holography, Diffractive Optics, and Applications
回次:	2002
会議開催地:	Shanghai, China
会議開催年:	2002.10.15-2002.10.17

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