Mesa or trench type for chromeless phase-shift lithography from photolithographic performance point of view
- 著者名:
Shi, X. ( ASML MaskTools, Inc. (USA) ) Chen, J.F. Hsu, S. Van Den Broeke, D.J. Socha, R.J. ( ASML (USA) ) Chang, C.H. ( Taiwan Semiconductor Manufacturing Co. (Taiwan) ) Dai, C.-M. - 掲載資料名:
- 22nd Annual BACUS Symposium on Photomask Technology
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 4889
- 発行年:
- 2002
- 巻:
- Part Two
- 開始ページ:
- 1304
- 終了ページ:
- 1312
- 総ページ数:
- 9
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819446756 [0819446750]
- 言語:
- 英語
- 請求記号:
- P63600/4889
- 資料種別:
- 国際会議録
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3
国際会議録
Near-0.3 k1 full pitch range contact hole patterning using chromeless phase lithography (CPL)
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |