Model-based OPC using the MEEF matrix

Model-based OPC using the MEEF matrix

著者名:

Cobb, N,B, ( Mentor Graphics Corp. (USA) )
Granik, Y.

掲載資料名:

22nd Annual BACUS Symposium on Photomask Technology

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4889

発行年:

2002

巻:

Part Two

開始ページ:

1281

終了ページ:

1292

総ページ数:

12

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819446756 [0819446750]

言語:

英語

請求記号:

P63600/4889

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00012737
シリーズID:	PA00000029
会議名:	Annual BACUS Symposium on Photomask Technology
回次:	22nd
会議開催地:	Monterey, California, USA
会議開催年:	2002.10.01-2002.10.04

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