Validation of ArF chromeless PSM in the sub-100-nm node DRAM cell
- 著者名:
Lee, J.-H. ( Samsung Electronics Co., Ltd. (South Korea) ) Chung, D.-H. Cha, D.-C. Kim, H.-S. Park, J.-S. Nam, D.-G. Woo, S.-K. Cho, H.-S. Han, W.-S. - 掲載資料名:
- 22nd Annual BACUS Symposium on Photomask Technology
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 4889
- 発行年:
- 2002
- 巻:
- Part Two
- 開始ページ:
- 1253
- 終了ページ:
- 1262
- 総ページ数:
- 10
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819446756 [0819446750]
- 言語:
- 英語
- 請求記号:
- P63600/4889
- 資料種別:
- 国際会議録
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9
国際会議録
Successful application of angular scatterometry to process control in sub-100-nm DRAM device
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |