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Validation of ArF chromeless PSM in the sub-100-nm node DRAM cell

著者名:
Lee, J.-H. ( Samsung Electronics Co., Ltd. (South Korea) )
Chung, D.-H.
Cha, D.-C.
Kim, H.-S.
Park, J.-S.
Nam, D.-G.
Woo, S.-K.
Cho, H.-S.
Han, W.-S.
さらに 4 件
掲載資料名:
22nd Annual BACUS Symposium on Photomask Technology
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
4889
発行年:
2002
巻:
Part Two
開始ページ:
1253
終了ページ:
1262
総ページ数:
10
出版情報:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819446756 [0819446750]
言語:
英語
請求記号:
P63600/4889
資料種別:
国際会議録

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