Advanced 193 tri-tone EAPSM (9% to 18%) for 65-nm node

Advanced 193 tri-tone EAPSM (9% to 18%) for 65-nm node

著者名:

Dieu, L. ( DuPont Photomasks, Inc. (USA) )

Fanucchi, E.L.

Hughes, G.P.

Maltabes, J.G. ( Motorola, Inc. (USA) )

Mellenthin, D.L. ( DuPont Photomasks, Inc. (USA) )

Conley, W. ( Motorola, Inc. (USA) )

Litt, L.C.

Lucas, K.

Socha, R.J. ( ASML (USA) )

掲載資料名:

22nd Annual BACUS Symposium on Photomask Technology

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4889

発行年:

2002

巻:

Part Two

開始ページ:

1227

終了ページ:

1233

総ページ数:

7

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819446756 [0819446750]

言語:

英語

請求記号:

P63600/4889

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00012737
シリーズID:	PA00000029
会議名:	Annual BACUS Symposium on Photomask Technology
回次:	22nd
会議開催地:	Monterey, California, USA
会議開催年:	2002.10.01-2002.10.04

類似資料:

1 国際会議録 Mighty high-T lithography for 65-nm generation contacts Conley, W., Montgomery, P.K., Lucas, K., Litt, L.C., Maltabes, J.G., Dieu, L., Hughes, G.P., Mellenthin, D.L., Socha, … SPIE-The International Society for Optical Engineering	7 国際会議録 Process, design, and optical proximity correction requirements for the 65-nm device generation Lucas, K., Montgomery, P., Litt, L.C., Conley, W., Postnikov, S.V., Wu, W., Yuan, C.-M., Olivares, M., Strozewski, K., … SPIE-The International Society for Optical Engineering
2 国際会議録 Effect of quartz phase etch on 193-nm alternating phase-shift mask performance for the 100- nm node Patterson, K., Litt, L.C., Maltabes, J.G., Hughes, G.P., Robertson, T., Montgomery, B. SPIE-The International Society for Optical Engineering	8 国際会議録 Process, design and optical proximity correction requirements for the 65nm device generation Lucas, K., Montgomery, P., Litt, L.C., Conley, W., Postnikov, S.V., Wu, W., Yuan, C.-M., Olivares, M., Strozewski, K., … SPIE-The International Society for Optical Engineering
3 国際会議録 The application of CPL reticle technology for the 0.045-mm node Conley, W., Van Den Broeke, D.J., Socha, R.J., Wu, W., Litt, L.C., Lucas, K.D., Roman, B.J., Peters, R.D., Parker, C., … SPIE - The International Society of Optical Engineering	9 国際会議録 CPL reticle technology for advanced device applications Conley, W.E., Van Den Broeke, D.J., Socha, R.J., Wu, W., Litt, L.C., Lucas, K.D., Roman, B.J., Peters, R.D., Parker, C., … SPIE - The International Society of Optical Engineering
4 国際会議録 Application of CPL reticle technology for the 65- and 50-nm node Conley, W., Broeke, D.J.V.D., Socha, R.J., Wu, W., Litt, L.C., Lucas, K., Nelson-Thomas, C.M., Roman, B.J., Chen, F., … SPIE-The International Society for Optical Engineering	10 国際会議録 Application of chromeless phase lithography (CPL) masks in ArF lithography Kasprowicz, B.S., Progler, C.J., Wu, W., Conley, W., Litt, L.C., Van Den Broeke, D.J., Wampler, K.E., Socha, R.J. SPIE-The International Society for Optical Engineering
5 国際会議録 Comparisons of 9% versus 6% transmission attenuated phase-shift mask for the 65-nm device mode Montgomery, P.K., Lucas, K.D., Litt, L.C., Conley, W., Fanucchi, E., Van Wingerden, J., Vandenberghe, G., Wiaux, V., … SPIE - The International Society of Optical Engineering	11 国際会議録 The impact of illumination on feature fidelity for CPL mask technology Kuijten, J. P., Verhappen, A., Conley, W., van de Goor, S., Litt, L., Wu, W., Lucas, K., Roman, B., Kasprowicz, B., … SPIE - The International Society of Optical Engineering
6 国際会議録 The impact of MEEF through pitch for 120-nm contact holes Litt, L.C., Wu, W., Conley, W., Lucas, K.D., Roman, B.J., Montgomery, P., Kasprowicz, B.S., Progler, C.J., Socha, R.J., … SPIE - The International Society of Optical Engineering	12 国際会議録 Development of a sub-100nm integrated imaging system using chromeless phase-shifting imaging with very high NA KrF exposure and off-axis illumination Petersen, J.S., Conley, W., Roman, B.J., Litt, L.C., Lucas, K., Wu, W., Van Den Broeke, D.J., Chen, J.F., Laidig, T.L., … SPIE-The International Society for Optical Engineering

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