Application of chromeless phase lithography (CPL) masks in ArF lithography
- 著者名:
Kasprowicz, B.S. ( Photronics Inc. (USA) ) Progler, C.J. Wu, W. ( Motorola, Inc. (USA) ) Conley, W. Litt, L.C. Van Den Broeke, D.J. ( ASML Masktools Inc. (USA) ) Wampler, K.E. Socha, R.J. ( ASML (USA) ) - 掲載資料名:
- 22nd Annual BACUS Symposium on Photomask Technology
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 4889
- 発行年:
- 2002
- 巻:
- Part Two
- 開始ページ:
- 1189
- 終了ページ:
- 1201
- 総ページ数:
- 13
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819446756 [0819446750]
- 言語:
- 英語
- 請求記号:
- P63600/4889
- 資料種別:
- 国際会議録
類似資料:
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
12
国際会議録
Near-0.3 k1 full pitch range contact hole patterning using chromeless phase lithography (CPL)
SPIE - The International Society of Optical Engineering |