Pattern inspection of EUV masks using DUV light

Pattern inspection of EUV masks using DUV light

著者名:

Liang, T. ( Intel Corp. (USA) )
Tejnil, E.
Stivers, A.R.

掲載資料名:

22nd Annual BACUS Symposium on Photomask Technology

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4889

発行年:

2002

巻:

Part Two

開始ページ:

1065

終了ページ:

1072

総ページ数:

8

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819446756 [0819446750]

言語:

英語

請求記号:

P63600/4889

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00012737
シリーズID:	PA00000029
会議名:	Annual BACUS Symposium on Photomask Technology
回次:	22nd
会議開催地:	Monterey, California, USA
会議開催年:	2002.10.01-2002.10.04

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2 国際会議録 EUV mask patterning approaches Yan,P., Zhang,G., Kofron,P., Chow,J., Stivers,A.R., Tejnil,E., Cardinale,G.F., Kearney,P.A. SPIE - The International Society for Optical Engineering	8 国際会議録 EUV mask absorber characterization and selection Yan,P., Zhang,G., Kofron,P., Powers,J.E., Tran,M., Liang,T., Stivers,A.R., Lo,F.-C. SPIE - The International Society for Optical Engineering
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