Advanced FIB mask repair technology for 100-nm/ArF lithography | 東京工業大学附属図書館文献データベース

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Advanced FIB mask repair technology for 100-nm/ArF lithography

著者名:

Hagiwara, R. ( Seiko Instruments, Inc. (Japan) )

Morikawa, Y. ( Dai Nippon Printing Co., Ltd. (Japan) )

Ozawa, T. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

さらに 17 件

掲載資料名:

22nd Annual BACUS Symposium on Photomask Technology

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4889

発行年:

2002

巻:

Part Two

開始ページ:

1056

終了ページ:

1064

総ページ数:

9

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819446756 [0819446750]

言語:

英語

請求記号:

P63600/4889

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00012737
シリーズID:	PA00000029
会議名:	Annual BACUS Symposium on Photomask Technology
回次:	22nd
会議開催地:	Monterey, California, USA
会議開催年:	2002.10.01-2002.10.04

類似資料:

1 国際会議録 Advanced FIB mask repair technology for 100-nm/ArF lithography: II Hagiwara, R., Yasaka, A., Aita, K., Takaoka, O., Koyama, Y., Kozakai, T., Doi, T., Muramatsu, M., Suzuki, K., Sugiyama, … SPIE-The International Society for Optical Engineering	7 国際会議録 Advanced FIB mask repair technology for ArF lithography: ？ Kubo,S., Hiruta,K., Morimoto,H., Yasaka,A., Hagiwara,R., Adachi,T., Morikawa,Y., Iwase,K., Hayashi,N. SPIE-The International Society for Optical Engineering
2 国際会議録 Advanced FIB mask repair technology for 90-nm/ArF lithography: III Tanaka, Y., Itou, Y., Yoshioka, N., Hagiwara, R., Yasaka, A., Takaoka, O., Kozakai, T., Koyama, Y., Sawaragi, H., … SPIE - The International Society of Optical Engineering	8 国際会議録 Advanced photomask repair technology for 65nm lithography (5) [6283-108] Aramaki, F., Kozakai, T., Sugiyama, Y., Muramatsu, M., Koyama, Y., Matsuda, O., Suzuki, K., Okabe, M., Hagiwara, R., … SPIE - The International Society of Optical Engineering
3 国際会議録 Advanced FIB mask repair technology for ArF lithography: ？ Hagiwara,R., Yasaka,A., Takaoka,O., Kozakai,T., Yabe,S., Koyama,Y., Muramatsu,M., Doi,T., Suzuki,K., Okabe,M., Aita,K., … SPIE-The International Society for Optical Engineering	9 国際会議録 Advanced photomask repair technology for 65-nm lithography (1) Itou, Y., Tanaka, Y., Yoshioka, N., Sugiyama, Y., Hagiwara, R., Takahashi, H., Takaoka, O., Tashiro, J., Suzuki, K., … SPIE - The International Society of Optical Engineering
4 国際会議録 Advanced photomask repair technology for 65-nm lithography: II Itou, Y., Tanaka, Y., Yoshioka, N., Sugiyama, Y., Hagiwara, R., Takahashi, H., Takaoka, O., Kozakai, T., Matsuda, O., … SPIE - The International Society of Optical Engineering	10 国際会議録 FIB mask repair technology for electron projection lithography Yamamoto, Y., Hasuda, M., Suzuki, H., Sato, M., Takaoka, O., Matsumura, H., Matsumoto, N., Iwasaki, K., Hagiwara, R., … SPIE - The International Society of Optical Engineering
5 国際会議録 Advanced photomask repair technology for 65-nm lithography [6349-50] Aramaki, F., Kozakai, T., Muramatsu, M., Sugiyama, Y., Koyama, Y., Matsuda, O., Suzuki, K., Okabe, M., Doi, T., … SPIE - The International Society of Optical Engineering	11 国際会議録 Advanced photomask repair technology for 65nm lithography (3) [5853-89] Itou, Y., Tanaka, Y., Sugiyama, Y., Hagiwara, R., Takahashi, H., Takaoka, O., Kozakai, T., Matsuda, O., Suzuki, K., … SPIE - The International Society of Optical Engineering
6 国際会議録 Advanced FIB mask repair technology in ArF lithography Hiruta,K., Kubo,S., Morimoto,H., Yasaka,A., Hagiwara,R., Adachi,T., Morikawa,Y., Iwase,K., Hayashi,N. SPIE - The International Society for Optical Engineering	12 国際会議録 Advanced photomask repair technology for 65 nm lithography (4) [5992-170] Itou, Y., Tanaka, Y., Suga, O., Sugiyama, Y., Hagiwara, R., Takahashi, H., Takaoka, O., Kozakai, T., Matsuda, O., … SPIE - The International Society of Optical Engineering

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