Defect printability analysis on alternating phase-shifting masks for 193-nm lithography
- 著者名:
Morikawa, Y. ( Dai Nippon Printing Co., Ltd. (Japan) ) Totsu, Y. Nishiguchi, M. Hoga, M. Hayashi, N. Pang, L. ( Numeical Technologies, Inc. (USA) ) Luk-Pat, G.T. - 掲載資料名:
- 22nd Annual BACUS Symposium on Photomask Technology
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 4889
- 発行年:
- 2002
- 巻:
- Part Two
- 開始ページ:
- 922
- 終了ページ:
- 934
- 総ページ数:
- 13
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819446756 [0819446750]
- 言語:
- 英語
- 請求記号:
- P63600/4889
- 資料種別:
- 国際会議録
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3
国際会議録
Feasibility study of manufacturing process and quality control for the new alternating PSM structure
SPIE-The International Society for Optical Engineering |
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