Programmable RET mask layout verification

Programmable RET mask layout verification

著者名:

Beale, D.F. ( Synopsys, Inc. (USA) )
Mayhew, J.P,
Rieger, M.L.
Tang, Z.

掲載資料名:

22nd Annual BACUS Symposium on Photomask Technology

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4889

発行年:

2002

巻:

Part Two

開始ページ:

896

終了ページ:

902

総ページ数:

7

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819446756 [0819446750]

言語:

英語

請求記号:

P63600/4889

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00012737
シリーズID:	PA00000029
会議名:	Annual BACUS Symposium on Photomask Technology
回次:	22nd
会議開催地:	Monterey, California, USA
会議開催年:	2002.10.01-2002.10.04

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1 国際会議録 Verifying RET mask layouts Mayhew, J.P., Rieger, M.L., Li, J.W., Zhang, L., Tang, Z.W., Shiely, J.P. SPIE-The International Society for Optical Engineering	7 国際会議録 OPC strategies to minimize mask cost and writing time Rieger,M.L., Mayhew,J.P., Li,J., Shiely,J.P. SPIE-The International Society for Optical Engineering
2 国際会議録 Enriching design intent for optimal OPC and RET Rieger, M.L., Gravoulet, V., Mayhew, J.P., Beale, D.F., Lugg, R.M. SPIE-The International Society for Optical Engineering	8 国際会議録 Understanding the parameters for strong phase-shift mask lithography Tritchkov,A.V., Stirniman,J.P., Mayhew,J.P., Rieger,M.L. SPIE - The International Society for Optical Engineering
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5 国際会議録 Multiple-stage optical proximity correction Beale, D.F., Shiely, J.P., Rieger, M.L. SPIE-The International Society for Optical Engineering	11 国際会議録 Model-based interpretation filtering for complex two-dimensional layout features Melvin, L.S., III, Shiely, J.P., Cork, C.M., Rieger, M.L. SPIE - The International Society of Optical Engineering
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