90-nm-node CD uniformity improvement using a controlled gradient temperature CAR PEB process

90-nm-node CD uniformity improvement using a controlled gradient temperature CAR PEB process

著者名:

Park, D.-I. ( Photronics-PKL (South Korea) )

掲載資料名:

22nd Annual BACUS Symposium on Photomask Technology

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4889

発行年:

2002

巻:

Part One

開始ページ:

634

終了ページ:

640

総ページ数:

7

出版情報:

Bellingham, WA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819446756 [0819446750]

言語:

英語

請求記号:

P63600/4889

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00012736
シリーズID:	PA00000029
会議名:	SPIE Photomask Technology : Annual BACUS Symposium on Photomask Technology
回次:	2002 : 22nd
会議開催地:	Monterey, California, USA
会議開催年:	2002.10.011-2002.10.04

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6 国際会議録 Comparative evaluation of mask production CAR development processes with stepwise defect inspection Jeong, W.-G., Lee, J.-K., Park, D.I., Park, E.-S., Lee, J.-H., Seo, S.-K., Lee, D.-H., Kim, J.-M., Choi, S.S., Jeong, … SPIE-The International Society for Optical Engineering	12 国際会議録 Develop process optimization for CD uniformity improvement Shin,J.-C., Won,J.-I., Jung,H.-Y., Kim,M.-S., Choi,Y.-K., Han,O. SPIE-The International Society for Optical Engineering

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