PMJ 2002 Panel Discussion Review: Lithography strategy from 90- to 65-nm nodes - ArF, F2, or EPL? (Invited Paper)

PMJ 2002 Panel Discussion Review: Lithography strategy from 90- to 65-nm nodes - ArF, F₂, or EPL? (Invited Paper)

著者名:

Tanabe, H. ( Elpida Memory, Inc. (Japan) )
Nagaoka, Y. ( KLA-Tencor Japan Ltd. (Japan) )

掲載資料名:

22nd Annual BACUS Symposium on Photomask Technology

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4889

発行年:

2002

巻:

Part One

開始ページ:

437

終了ページ:

449

総ページ数:

13

出版情報:

Bellingham, WA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819446756 [0819446750]

言語:

英語

請求記号:

P63600/4889

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00012736
シリーズID:	PA00000029
会議名:	SPIE Photomask Technology : Annual BACUS Symposium on Photomask Technology
回次:	2002 : 22nd
会議開催地:	Monterey, California, USA
会議開催年:	2002.10.011-2002.10.04

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