Blank Cover Image

Evaluation of the capability of a multibeam confocal inspection system for inspection of EUVL mask blanks

著者名:
Stivers, A.R. ( Intel Corp. (USA) )
Liang, T.
Penn, M.J.
Lieberman, B.
Shelden, G.V. ( International SEMATECH (USA) )
Folta, J.A. ( Lawrence Livermore National Lab. (USA) )
Larson, C.C.
Mirkarimi, P.B.
Walton, C.C.
Gulliksong, E.M. ( Lawrence Berkeley National Lab. (USA) )
Yi, M.
さらに 6 件
掲載資料名:
22nd Annual BACUS Symposium on Photomask Technology
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
4889
発行年:
2002
巻:
Part One
開始ページ:
408
終了ページ:
417
総ページ数:
10
出版情報:
Bellingham, WA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819446756 [0819446750]
言語:
英語
請求記号:
P63600/4889
資料種別:
国際会議録

類似資料:

1 国際会議録 Advances in low-defect multilayers for EUVL mask blanks

Folta, J.A., Davidson, J.C., Larson, C.C., Walton, C.C., Kearney, P.A.

SPIE-The International Society for Optical Engineering
7 国際会議録 Low-defect EUVI multilayers on standard-format mask blanks

Folta, J.A., Kearney, P.A., Larson, C.C., Crosley, M.K., Fisch, E., Racette, K.C.

SPIE-The International Society for Optical Engineering
2 国際会議録 At-wavelength inspection of defect smoothing in EUVL masks

Yi, M., Park, M., Mirkarimi, P.B., Larson, C., Bokor, J.

SPIE-The International Society for Optical Engineering
8 国際会議録 Defect repair for extreme-ultraviolet lithography (EUVL) mask blanks

Hau-Riege, S.P., Barty, A., Mirkarimi, P.B., Stearns, D.G., Chapman, H.N., Sweeney, D.W., Clift, W.M., Gullikson, E., …

SPIE-The International Society for Optical Engineering
3 国際会議録 EUVL mask blank repair

Barty, A., Mirkarimi, P.B., Stearns, D.G., Sweeney, D.W., Chapman, H.N., Clift, M., Hector, S.D., Yi, M.

SPIE-The International Society for Optical Engineering
9 国際会議録 Mask blanks and their (sometimes invisible) defects

Fisch, E., Racette, K.C., Folta, J.A., Larson, C.C.

SPIE-The International Society for Optical Engineering
4 国際会議録 EUV substrate and blank inspection with confocal microscopy

Urbach, J.-P., Cavelaars, J.F.W., Kusunose, H., Liang, T., Stivers, A.R.

SPIE - The International Society of Optical Engineering
10 国際会議録 Low-defect reflective mask blanks for extreme ultraviolet lithography

Burkhart,S.C., Cerjan,C.J., Kearney,P.A., Mirkarimi,P.B., Walton,C.C., Ray-Chaudhuri,A.K.

SPIE - The International Society for Optical Engineering
5 国際会議録 E-beam mask repair: fundamental capability and applications

Liang, T., Frendberg, E., Bald, D. J., Penn, M., Stivers, A. R.

SPIE - The International Society of Optical Engineering
11 国際会議録 EUV mask pilot line at Intel Corporation (Keynote Address)

Stivers, A. R., Yan, P. -Y., Zhang, G., Shu, E. Y., Tejnil, E., Lieberman, B., Nagpal, R., Hsia, K., Penn, M., Lo, F. …

SPIE - The International Society of Optical Engineering
6 国際会議録 Defect mitigation and reduction in EUVL mask blanks

R. Randive, A. Ma, I. Reiss, P. Mirkarimi, E. Spiller, B. Beier, T. Uno, P. Kearney, C. Jeon

SPIE - The International Society of Optical Engineering
12 国際会議録 Demonstration of damage-free mask repair using electron beam-induced processes

Liang, T., Stivers, A.R., Penn, M., Bald, D., Sethi, C., Boegli, V., Budach, M., Edinger, K., Spies, P.

SPIE - The International Society of Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12