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Electron-beam-induced processes and their applicability to mask repair

著者名:
Boegli, V.A. ( NaWoTec GmbH (USA) )
Koops, H.W.P.
Budach, M.
Edinger, K.
Hoinkis, O.
Weyrauch, B.
Becker, R.
Schmidt, R.
Kaya, A.
Reinhardt, A.
Brauuer, C.
Honold, H. ( LEO Elektronenmikroskopie GmbH (Germany) )
Bihr, J.
Greiser, J.
Eisenmann, M.
さらに 10 件
掲載資料名:
22nd Annual BACUS Symposium on Photomask Technology
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
4889
発行年:
2002
巻:
Part One
開始ページ:
283
終了ページ:
292
総ページ数:
10
出版情報:
Bellingham, WA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819446756 [0819446750]
言語:
英語
請求記号:
P63600/4889
資料種別:
国際会議録

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