Reticle defect printability: impact on yield and feedback to suppliers

Reticle defect printability: impact on yield and feedback to suppliers

著者名:

Vinle, R. ( Cypress Semiconductor Inc. (USA) )

Klaum, A.D. ( KLA-Tencor Corp. (USA) )

Chmielewski, D. ( Cypress Semiconductor Inc. (USA) )

Lamantia, M.J. ( DuPont Photomasks, Inc. (USA) )

Woolery, D.M. ( Cypress Semiconductor Inc. (USA) )

Coburn, D.L.

Weins, C.P. ( DuPont Photomasks, Inc. (USA) )

さらに 2 件

掲載資料名:

22nd Annual BACUS Symposium on Photomask Technology

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4889

発行年:

2002

巻:

Part One

開始ページ:

271

終了ページ:

282

総ページ数:

12

出版情報:

Bellingham, WA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819446756 [0819446750]

言語:

英語

請求記号:

P63600/4889

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00012736
シリーズID:	PA00000029
会議名:	SPIE Photomask Technology : Annual BACUS Symposium on Photomask Technology
回次:	2002 : 22nd
会議開催地:	Monterey, California, USA
会議開催年:	2002.10.011-2002.10.04

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