PRIMADONNA: a system for automated defect disposition of production masks using wafer lithography simulation

PRIMADONNA: a system for automated defect disposition of production masks using wafer lithography simulation

著者名:

Bald, D.J. ( Intel Corp. (USA) )
Munir, S.
Lieberman, B.
Howard, W.H. ( KLA-Tencor Corp. (USA) )
Mack, C.A.

掲載資料名:

22nd Annual BACUS Symposium on Photomask Technology

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4889

発行年:

2002

巻:

Part One

開始ページ:

263

終了ページ:

270

総ページ数:

8

出版情報:

Bellingham, WA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819446756 [0819446750]

言語:

英語

請求記号:

P63600/4889

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00012736
シリーズID:	PA00000029
会議名:	SPIE Photomask Technology : Annual BACUS Symposium on Photomask Technology
回次:	2002 : 22nd
会議開催地:	Monterey, California, USA
会議開催年:	2002.10.011-2002.10.04

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1 国際会議録 DIVAS: fully automated simulation based mask defect dispositioning and defect management system Munir, S., Bald, D. J., Tolani, V., Ghadiali, F., Lieberman, B. SPIE - The International Society of Optical Engineering	7 国際会議録 Defect dispositioning using mask printability on attenuated phase-shift production photomasks Novak,J.W., Eynon,B.G., Rosenbusch,A., Goldenshtein,A. SPIE-The International Society for Optical Engineering
2 国際会議録 DIVAS: an integrated networked system for mask defect dispositioning and defect management Munir, S., Bald, D., Tolani, V., Ghadiali, F. SPIE-The International Society for Optical Engineering	8 国際会議録 Defect dispositioning using mask printability on attenuated phase-shift production photomasks Novak,J.W., Eynon,B.G., Poortinga,E., Rosenbusch,A., Eran,Y. SPIE-The International Society for Optical Engineering
3 国際会議録 Lithography-based automation in the design of program defect masks Vakanas, G.P., Munir, S., Tejnil, E., Bald, D.J., Nagpal, R. SPIE - The International Society of Optical Engineering	9 国際会議録 Mask topography simulation for EUV lithography Gordon,R.L., Mack,C.A. SPIE - The International Society for Optical Engineering
4 国際会議録 Image-based metrology software for analysis of features on masks and wafers Munir, S., Bald, D. J., Tolani, V., Haussecker, H. SPIE - The International Society of Optical Engineering	10 国際会議録 Results from a new reticle defect inspection platform Broadbent, W.H., Wiley, J.N., Saidin, Z.K., Watson, S.G., Alles, D.S., Zurbrick, L.S., Mack, C.A. SPIE - The International Society of Optical Engineering
5 国際会議録 Electron-beam lithography simulation for mask making: I Mack,C.A. SPIE-The International Society for Optical Engineering	11 国際会議録 Accurate aerial image simulation using high-resolution reticle inspection images Howard, W. B., Mack, C. A. SPIE - The International Society of Optical Engineering
6 国際会議録 A simulation-based defect disposition flow for incoming mask quality assurance [5992-185] Lee, D., Chu, B., Fang, T. Y., Shieh, W. B., Hu, S., Chen, J. -H., Morgan, R. SPIE - The International Society of Optical Engineering	12 国際会議録 Electron-beam lithography simulation for mask making: ？. Comparison of 10- and 50-kV GHOST proximity effect correction Mack,C.A. SPIE-The International Society for Optical Engineering

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