Deep reactive ion etching of silicon using an aluminum etching mask

Deep reactive ion etching of silicon using an aluminum etching mask

著者名:

Wang, W.-C. ( Univ. of Washington (USA) )
Ho, J.N.
Reinhall, P.G.

掲載資料名:

Opto-Ireland 2002: Optics and Photonics Technologies and Applications

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4876

発行年:

2003

巻:

Part Two

開始ページ:

633

終了ページ:

640

総ページ数:

8

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819446572 [0819446572]

言語:

英語

請求記号:

P63600/4876

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00012723
シリーズID:	PA00000029
会議名:	Opto-Ireland
回次:	2002
会議開催地:	Galway, Ireland
会議開催年:	2002.09.05-2002.09.06

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