Source modeling and calculation of mask illumination during extreme-ultraviolet lithography condenser design

Source modeling and calculation of mask illumination during extreme-ultraviolet lithography condenser design

著者名:

Laughlin, L. ( Optical Sciences Ctr./Univ. of Arizona (USA) )
Sasian, J.M.

掲載資料名:

International optical design conference 2002 : 3-5 June, 2002, Tucson, Arizona, USA

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4832

発行年:

2002

開始ページ:

283

終了ページ:

292

総ページ数:

10

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819446084 [0819446084]

言語:

英語

請求記号:

P63600/4832

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00012669
シリーズID:	PA00000029
会議名:	International Optical Design Conference
回次:	2002
会議開催地:	Tucson, AZ, USA
会議開催年:	2002.06.03-2002.06.05

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