Simulation study of 193-nm phase-shifting masks: analysis of distributed aefectsof embeded attenuated phase mask (EAPSM)

Simulation study of 193-nm phase-shifting masks: analysis of distributed aefectsof embeded attenuated phase mask (EAPSM)

著者名:: Karklin, L. ( Numerical Technologies, Inc. (USA) )
掲載資料名:: 18th European Conference on Mask Technology for Integrated Circuits and Microcomponents
シリーズ名:: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:: 4764
発行年:: 2002
開始ページ:: 240
終了ページ:: 243
総ページ数:: 4
出版情報:: Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:: 0277786X
ISBN:: 9780819445315 [0819445312]
言語:: 英語
請求記号:: P63600/4764
資料種別:: 国際会議録

詳細

TDL書誌ID:	ZA00012602
シリーズID:	PA00000029
会議名:	European Mask and Lithography Conference : European Conference on Mask technology for Integrated Circuits and Microcomponents
回次:	2002 : 18th
会議開催地:	Munich, Germany
会議開催年:	2002.01.15-2002.01.16

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