Ion projection lithography (IPL): posters presented at the 5th International SEMATECH Next-Generation Lithography (NGL) workdhop (Invited Poster)

Ion projection lithography (IPL): posters presented at the 5th International SEMATECH Next-Generation Lithography (NGL) workdhop (Invited Poster)

著者名:

Kaesmaier, R. ( Infineon Technologies AG (Geramny) )

Loeschner, H. ( IMS Nanofabrication GmbH (Austria) )

de Jager, P.W.H. ( TNO/TPD (Netherlands) )

Ehrmann, A. ( Infineon Technologies AG (Germany) )

Hirscher, S.

Kragler, K.

Springer, R. ( Institute for Microelectronics (Germany) )

Stengl, G. ( IMS - Ion Microfabrication Systems GmbH (Austria) )

Wolter, A. ( Infineon Technologies AG (Germany) )

さらに 4 件

掲載資料名:

18th European Conference on Mask Technology for Integrated Circuits and Microcomponents

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4764

発行年:

2002

開始ページ:

235

終了ページ:

239

総ページ数:

5

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819445315 [0819445312]

言語:

英語

請求記号:

P63600/4764

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00012602
シリーズID:	PA00000029
会議名:	European Mask and Lithography Conference : European Conference on Mask technology for Integrated Circuits and Microcomponents
回次:	2002 : 18th
会議開催地:	Munich, Germany
会議開催年:	2002.01.15-2002.01.16

類似資料:

1 国際会議録 Large-field ion optics for projection and proximity printing and for maskless lithography (MLZ) Loeschner, H., Stengl, G., Buschbeck, H., Chalupka, A., Lammer, G., Platzgummer, E., Vonach, H., de Jager, P.W.H., … SPIE-The International Society for Optical Engineering	7 国際会議録 NGL process and the role of International SEMATECH (Invited Paper) Dao, G.T., Mackay, R.S., Seidel, P.K. SPIE-The International Society for Optical Engineering
2 国際会議録 Ion projection lithography: new insights and results of this NGL technology Struck,T., Ehrmann,A., Kaesmaier,R., Loschner,H. SPIE-The International Society for Optical Engineering	8 国際会議録 Projection maskless lithography Brandstatter, C., Loeschner, H., Stengl, G., Lammer, G., Buschbeck, H., Platzgummer, E., Doring, H.-J., Elster, T., … SPIE - The International Society of Optical Engineering
3 国際会議録 Measures to achieve 20-nm IPL stenecil mask distortion Hougeneder, E., Chalupka A., Lammer, T., Loeschner, H., Kamm, F.-M., Struck, T., Ehrmann, A., Kaesmaier, R., Wolter, A., … SPIE-The International Society for Optical Engineering	9 国際会議録 Resist technologies for ion projection lithography(IPL)stencil maskmaking Irmscher,M., Butschke,J., Elian,K., Hoefflinger,B., Kragler,K., Letzkus,F., Ochsenhirt,J., Reuter,C., Springer,R. SPIE - The International Society for Optical Engineering
4 国際会議録 Overview of the ion projection lithography European MEDEA and international program Kaesmaier,R., Loschner,H. SPIE - The International Society for Optical Engineering	10 国際会議録 Ion projection lithography for IC manufacturing Ehrmann,A., Loschner,H., Kasmaier,R. SPIE - The International Society for Optical Engineering
5 国際会議録 Ion projection lithography: November 2000 status and sub-70-nm prospects Kaesmaier,R., Wolter,A., Loschner,H., Schunck,S. SPIE-The International Society for Optical Engineering	11 国際会議録 Layout postprocessing in ion projection lithography(IPL) Hartmann,H., Petraschenko,A., Schunk,S., Steinmetz,R., Haugeneder,E., Loschner,H. SPIE - The International Society for Optical Engineering
6 国際会議録 Status of Ion Projection Lithography Bruenger, Wilhelm H., Kaesmaier, Rainer, Loeschner, Hans, Springer, Reinhard Materials Research Society	12 国際会議録 Ion projection lithography (Invited Paper) Melngailis,J., Loschner,H., Stengl,G., Berry,I.L., Mondelli,A.A., Gross,G. SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12