Blank Cover Image

Advanced optical imaging platform for CD metrology and defect review on 130-nm to 100-nm node reticles: and overview of preliminary results

著者名:
Hourd, A.C. ( Compugraphics International Ltd. (UK) )
Grimshaw, A.
Scheuring, G. ( MueTec GmbH (Germany) )
Gittinger, C.
Brueck, H.-J.
Chen, S.-B. ( Taiwan Mask Corp )
Chen, P.W.
Hartmann, H. ( PDF Solutions GmbH (Germany) )
Ordynskyy, V.
Jonckheere, R.M. ( IMEC vzw (Belgium) )
Philipsen, V.
Schaetz, T. ( Infineon Technologies AG (Geramny) )
Sommer, K. ( Karl Sommer consulting (Germany) )
さらに 8 件
掲載資料名:
18th European Conference on Mask Technology for Integrated Circuits and Microcomponents
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
4764
発行年:
2002
開始ページ:
168
終了ページ:
174
総ページ数:
7
出版情報:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819445315 [0819445312]
言語:
英語
請求記号:
P63600/4764
資料種別:
国際会議録

類似資料:

1 国際会議録 Implementation of 248-nm based CD metrology for advanced reticle production

Hourd, A.C., Grimshaw, A., Scheuring, G., Gittinger, C., Doebereiner, S., Hillmann, F., Brueck, H.-J., Hartmann, H., …

SPIE-The International Society for Optical Engineering
7 国際会議録 DUV water immersion technology extends linearity: first results from the new 65nm node CD metrology system LWM500 WI

Hillmann, F., Dobereiner, S., Gittinger, C., Reiter, R., Falk, G., Bruck, H.-J., Scheuring, G., Bosser, A., Heiden, M., …

SPIE - The International Society of Optical Engineering
2 国際会議録 Reliable subnanometer repeatability for CD metrology in a reticle production environment

Hourd, A.C., Grimshaw, A., Scheuring, G., Gittinger, C., Doebereiner, S., Hillmann, F., Brueck, H.-J., Chen, S.-B., …

SPIE-The International Society for Optical Engineering
8 国際会議録 Defect printability for 100-nm design rule using 193-nm lithography

Philipsen, V., Jonckheere, R.M., Kohlpoth, S., Torres, A.

SPIE-The International Society for Optical Engineering
3 国際会議録 Through-pellicle-capable DUV-based CD metrology on reticles for wafer fab and R&D environment

Jonckheere, R.M., Philipsen, V., Scheuring, G., Hillmann, F., Brueck, H.-J., Ordynskyy, V., Peter, K., Hourd, A.C., …

SPIE-The International Society for Optical Engineering
9 国際会議録 Analysis of the impact of reticle CD variations on the available process windows for a 100-nm CMOS process

Verhaegen, S., Vandenberghe, G., Jonckheere, R.M., Ronse, K.G.

SPIE-The International Society for Optical Engineering
4 国際会議録 Fully automated CD: metrology and mask inspection in a mask production environment using the MueTec (M5k) DUV tool

Scheuring, G., Petrashenko, A., Doebereiner, S., Hillmann, F., Brucek, H.-J., Hourd, A.C., Grimshaw, A., Hughes, G., …

SPIE-The International Society for Optical Engineering
10 国際会議録 Printability study for phase-shift masks at 193-nm lithography

Philipsen, V., Jonckheere, R.M.

SPIE-The International Society for Optical Engineering
5 国際会議録 CD metrology on OPC features using light optical and electron optical tools

Schaetz,T., Doebereiner,S., Scheuring,G., Brueck,H.-J.

SPIE-The International Society for Optical Engineering
11 国際会議録 Feature proximity errors on mask: assessment results of commercially obtained reticles

Jonckheere, R.M., Potoms, G., Philipsen, V.

SPIE-The International Society for Optical Engineering
6 国際会議録 Extended defect printability study for 100-nm design rule using 193-nm lithography

Philipsen, V., Jonckheere, R.M.

SPIE-The International Society for Optical Engineering
12 国際会議録 Aerial image simulations of soft and phase defects in 193-nm lithography for 100-nm node

Driessen, F.A., van Adrichem, P., Philipsen, V., Jonckheere, R., Liu, H.-Y., Karklin, L.

SPIE-The International Society for Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12