Measures to achieve 20-nm IPL stenecil mask distortion | 東京工業大学附属図書館文献データベース

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Measures to achieve 20-nm IPL stenecil mask distortion

著者名:

Hougeneder, E. ( IMS Nanofabrication GmbH (Austria) )

Kamm, F.-M. ( Infineon Technologies AG (Germany) )

Butschke, J. ( Institut fuer Mikroelektronik Stuttgart (Germany) )

さらに 8 件

掲載資料名:

18th European Conference on Mask Technology for Integrated Circuits and Microcomponents

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4764

発行年:

2002

開始ページ:

23

終了ページ:

31

総ページ数:

9

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819445315 [0819445312]

言語:

英語

請求記号:

P63600/4764

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00012602
シリーズID:	PA00000029
会議名:	European Mask and Lithography Conference : European Conference on Mask technology for Integrated Circuits and Microcomponents
回次:	2002 : 18th
会議開催地:	Munich, Germany
会議開催年:	2002.01.15-2002.01.16

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