Raster scan patterning solution for 100-and 70-nm OPC masks
- 著者名:
Abboud, F.E. ( Etec Systems, Inc. (USA) ) Baik, K.-H. Chakarian, V. Cole, D. M. Dean, R.L. Gesley M.A. Gillman. H. Moore, W.C. Mueller, M. Naber, R.J. Newman, T.H. Puri, R. Raymond, F., III Rougieri, M. - 掲載資料名:
- Photomask and Next-Generation Lithography Mask Technology IX
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 4754
- 発行年:
- 2002
- 開始ページ:
- 705
- 終了ページ:
- 716
- 総ページ数:
- 12
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819445179 [0819445177]
- 言語:
- 英語
- 請求記号:
- P63600/4754
- 資料種別:
- 国際会議録
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