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Lithographic analysis of distributed photomask defects: II. Random mask CD errors

著者名:
Karklin, L. ( Bindkey Technologies, Inc. (USA) )  
掲載資料名:
Photomask and Next-Generation Lithography Mask Technology IX
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
4754
発行年:
2002
開始ページ:
660
終了ページ:
665
総ページ数:
6
出版情報:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819445179 [0819445177]
言語:
英語
請求記号:
P63600/4754
資料種別:
国際会議録

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