Novel procedure for mask disposition electrical signatures of mask defects
- 著者名:
- Balasinski, A. ( Cypress Semiconductor (USA) )
- Iandolo, W.
- Ray, O.
- Karklin, L. ( Numerical Technologies, Inc. (USA) )
- Axelrad, V. ( Sequoia Design System, Inc. (USA) )
- 掲載資料名:
- Photomask and Next-Generation Lithography Mask Technology IX
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 4754
- 発行年:
- 2002
- 開始ページ:
- 606
- 終了ページ:
- 613
- 総ページ数:
- 8
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819445179 [0819445177]
- 言語:
- 英語
- 請求記号:
- P63600/4754
- 資料種別:
- 国際会議録
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11
国際会議録
Defect dispositioning using mask printability on attenuated phase-shift production photomasks
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