Blank Cover Image

Hard pellicle study for 157-nm lithography

著者名:
Shu, E.Y. ( Intel Corp. (USA) )
Lo, F.-C.
Eschbach, F.O.
Cotte, E.P. ( Univ. of Wisconsin/Madison (USA) )
Engelstand, R.L.
Lovell, E.G.
Okada, K. ( Asahi Glass Co. Ltd. (Japan) )
Kikugawa, S.
さらに 3 件
掲載資料名:
Photomask and Next-Generation Lithography Mask Technology IX
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
4754
発行年:
2002
開始ページ:
558
終了ページ:
569
総ページ数:
12
出版情報:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819445179 [0819445177]
言語:
英語
請求記号:
P63600/4754
資料種別:
国際会議録

類似資料:

1 国際会議録 Mechanical analysis of hard pellicles for 157-nm lithography

Reu,P.L., Mikkelson,A.R., Schlax,M.P., Cotte,E.P., Siewert,L.K., Engelstad,R.L., Lovell,E.G., Dao,G.T., Zheng,J.-F.

SPIE-The International Society for Optical Engineering
7 国際会議録 Pellicle-induced distortions in advance photomasks

Fujita, M., Akiyama, M., Kondo, M., Nakagawa, H., Tanzil, D., Eschbach, F.O., Cotte, E.P., Engelstad, R.L., Lovell, E.G.

SPIE-The International Society for Optical Engineering
2 国際会議録 Numerical and experimental studies of pellicle-induced photomask distortions

Cotte,E.P., Engelstad,R.L., Lovell,E.G., Shkel,Y.M., Eschbach,F.O., Shu,E.Y., Tanzil,D., Calhoun,R.M.

SPIE-The International Society for Optical Engineering
8 国際会議録 Mask-related distortions of modified fused silica reticles for 157-nm lithography

Mikkelson,A.R., Abdo,A.Y., Cotte,E.P., Sohn,J., Engelstad,R.L., Lovell,E.G.

SPIE-The International Society for Optical Engineering
3 国際会議録 Experimental and numerical studies of the effects of materials and attachment conditions on pellice-induced distortions in advanced photomasks

Cotte, E.P., Engelstad, R.L., Lovell, E.G., Tanzil, D., Eschbach, F.O., Shu, E.Y.

SPIE-The International Society for Optical Engineering
9 国際会議録 Effects of soft pellicle frame curvature and mounting process on pellicle-induced distortions in advanced photomasks

Cotte, E.P., Engelstad, R.L., Lovell, E.G., Tanzil, D., Eschbach, F.O., Korobko, Y.O., Fujita, M., Nakagawa, H.

SPIE-The International Society for Optical Engineering
4 国際会議録 Experimental and numerical studies of the response of photomask hard pellicles to acoustic excitation

Cotte, E.P., Reu, P.L., Engeistad, R.L., Lovell, E.G., Grenville, A., Van Peski, C.K.

SPIE-The International Society for Optical Engineering
10 国際会議録 Development of hard pellicle for 157 nm

Okada, K., Ootsuka, K., Ishikawa, I., Ikuta, Y., Kojima, H., Kawahara, T., Minematsu, T., Mishiro, H., Kikugawa, S., …

SPIE-The International Society for Optical Engineering
5 国際会議録 Hard pellicle investigation for 157-nm lithography: impact on overlay

Bruls, R., Uitterdijk, T., Cicilia, O., De Bisschop, P., Kocsis, M. K., Grenville, A., Van Peski, C. K., Engelstad, R. …

SPIE - The International Society of Optical Engineering
11 国際会議録 Predicting mechanical distortions in x-ray masks

Cotte,E.P., Engelstad,R.L., Lovell,E.G., Brooks,C.J.

SPIE - The International Society for Optical Engineering
6 国際会議録 Experimental investigation of hard pellicle purge processes

Abdo, A.Y., Nellis, G.F., Diab, A.K., Cotte, E.P., Chalekian, A.J., Engelstad, R.L., Lovell, E.G., Peski, C.V.

SPIE - The International Society of Optical Engineering
12 国際会議録 Film stress changes during anodic bonding of NGL masks

Cotte,E.P., Schlax,M.P., Engelstad,R.L., Lovell,E.G., Brooks,C.J.

SPIE - The International Society for Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12