Progressive self-learning photomask defect classification

Progressive self-learning photomask defect classification

著者名:

Lynn, E.C. ( Mentor Graphics Taiwan Ltd. )
Chen, S.-Y.
Hsu, T.-H. ( Taiwan Semiconductor Manufacturing., Ltd. )
Hung, C.-C.
Lin, C.-H.

掲載資料名:

Photomask and Next-Generation Lithography Mask Technology IX

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4754

発行年:

2002

開始ページ:

483

終了ページ:

491

総ページ数:

9

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819445179 [0819445177]

言語:

英語

請求記号:

P63600/4754

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00012591
シリーズID:	PA00000029
会議名:	Photomask and next-generation lithography mask technology
回次:	2002 : 9th
会議開催地:	Yokohama, Japan
会議開催年:	2002.04.23-2002.04.25

類似資料:

1 国際会議録 Binary mask defect printability for 130-nm ArF lithography Lin,S.C., Chen,J.H., Hsu,T.H., Hung,J.C.C., Lin,J.C.H. SPIE-The International Society for Optical Engineering	7 国際会議録 Life is better without nonorthogonal or non-45-deg. edges: a practical solution to alleviate the pain on OPC and mask writing Lynn, E.C., Chen, S.-Y. SPIE-The International Society for Optical Engineering
2 国際会議録 Evaluation, reduction, and monitoring of progressive defects on 193-nm reticles for low-k1 process Shiao, C.H., Tsai, C.-C., Hsu, T., Tuan, S., Chang, D., Chen, R., Hsieh, F. SPIE - The International Society of Optical Engineering	8 国際会議録 Template of specifications for assist feature script implementation Chen, S.-Y., Lynn, E.C. SPIE-The International Society for Optical Engineering
3 国際会議録 Local defect real-time monitor system in lithography Chen,H.-C., Lin,T.-Y., Chu,Y.-C., Hung,C.-C. SPIE - The International Society for Optical Engineering	9 国際会議録 Flexible fragmentation rules for next-generation OPC: tag prior to fragmentation Chen, S.-Y., Lynn, E.C. SPIE-The International Society for Optical Engineering
4 国際会議録 Hausdorif distance based PCB inspection system with defect classification [6000-08] Chen, C.-J., Lai, S.-H., Lee, W.-H., Lin, C.-Y., Ku, T., Chen, C.-H., Chung, Y.-C. SPIE - The International Society of Optical Engineering	10 国際会議録 Photomask defect tracing, analysis, and reduction with chemically amplified resist process Lin, C.-., Lai, R., Huang, W.H., Wang, B.C., Chen, C.Y., Kung, C.H., Yoo, C.-S., Chen, J.-J., Lee, S.-C. SPIE-The International Society for Optical Engineering
5 国際会議録 Prevention instead of cure: pre-OPC treatment of photomask layouts Huang,J., Chiou,K.F., Lee,S., Chen,S.-Y., Lynn,E.C. SPIE-The International Society for Optical Engineering	11 国際会議録 Improvement in defect classification efficiency by grouping disposition for reticle inspection [5992-11] Lai, R., Hsu, L. T. H., Chang, P., Ho, C. H., Tsai, F., Long, G., Yu, P., Miller, J., Hsu, V., Chen, E. SPIE - The International Society of Optical Engineering
6 国際会議録 Effective placement of chips on a shuttle mask Chen, S.-Y., Lynn, E.C. SPIE-The International Society for Optical Engineering	12 国際会議録 Defect detection for short-loop process and SRAM-cell optimization by using addressable failure site-test structures(AFS-TS) Doong, K.Y.-Y., Hsieh, S., Lin, S.C., Wang, J.R., Shen, B., Hung, L.J., Guo, J.C., Chen, I.C., Young, K.L., Hsu, C.C.-H. SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12