Application of AISi-based materials on approach of chemical stability of embedded layer for bilayer attenuated phase-shifting mask in 1993-nm lithography

Application of AISi-based materials on approach of chemical stability of embedded layer for bilayer attenuated phase-shifting mask in 1993-nm lithography

著者名:

Lin, C.-M. ( Taiwan Semiconductor Manufacturing Co., Ltd. )
Loong, W.-A. ( National Chiao Tung Univ. (Taiwan) )

掲載資料名:

Photomask and Next-Generation Lithography Mask Technology IX

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4754

発行年:

2002

開始ページ:

428

終了ページ:

436

総ページ数:

9

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819445179 [0819445177]

言語:

英語

請求記号:

P63600/4754

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00012591
シリーズID:	PA00000029
会議名:	Photomask and next-generation lithography mask technology
回次:	2002 : 9th
会議開催地:	Yokohama, Japan
会議開催年:	2002.04.23-2002.04.25

類似資料:

1 国際会議録 Studies of nitride- and oxide-based materials as absorptive shifters for embedded attenuated phase-shifting mask in 193 nm Lin,C., Chang,K., Lee,M., Loong,W. SPIE - The International Society for Optical Engineering	7 国際会議録 Feasibility study on the ArF attenuated phase-shift mask for 100-nm node lithography Koo,S.-S., Kim,S.-J., Paek,S.-W., Ahn,C.-N., Ham,Y.-M., Shin,K.-S. SPIE-The International Society for Optical Engineering
2 国際会議録 TiSix as a new embedded material for attenuated phase-shift mask Loong,W., Chen,T., Shy,S., Tseng,J., Lin,R. SPIE-The International Society for Optical Engineering	8 国際会議録 Investigation of attenuated phase-shifting mask material for 157-nm lithography Onodera,T., Matsuo,T., Itani,T., Morimoto,H. SPIE-The International Society for Optical Engineering
3 国際会議録 Application of attenuated phase-shifting masks to sub-130-nm lithography Koo,C.-K., Choo,L.-C., Lin,Q., Tan,S.-S., Lee,H.-J., Tam,S.-C., See,A. SPIE-The International Society for Optical Engineering	9 国際会議録 TiSi-nitride-based attenuated phase-shift mask for ArF Lithography Koo,S.-S., Hur,I.-B., Koo,Y.-M., Baik,K.-H., Choi,I.-H., Kim,L.-J., Park,K.-T., Shin,C. SPIE - The International Society for Optical Engineering
4 国際会議録 Simulation of transmittance on the effect of resolution enhancement of 100-nm pattern with attenuated phase-shifting mask in 193-nm lithography Lin, C.-M. SPIE-The International Society for Optical Engineering	10 国際会議録 Development of embedded attenuated phase-shifting mask(EAPSM)blanks for ArF lithography Mitsui,H., Nozawa,O., Ohtsuka,H., Takeuchi,M., Kobayashi,H., Ushida,M. SPIE - The International Society for Optical Engineering
5 国際会議録 New approach to phase metrology for manufacturing 248-nm lithography-based embedded attenuated phase-shifting mask Dao,G.T., Liu,G., Snyder,A., Farnsworth,J.N. SPIE-The International Society for Optical Engineering	11 国際会議録 Novel Si-based composite thin films for 193/157-nm attenuated phase-shift mask (APSM) applications Chey,S.J., Guarnieri,C.R., Babich,K., Pope,K.R., Goldfarb,D., Angelopoulos,M., Racette,K.C., Hibbs,M.S., Gibson,M.L., … SPIE-The International Society for Optical Engineering
6 国際会議録 Materials for an attenuated phase-shifting mask in 157-nm lithography Matsuo,T., Onodera,T., Itani,T., Morimoto,H., Haraguchi,T., Kanayama,K., Otaki,M. SPIE-The International Society for Optical Engineering	12 国際会議録 Realization of mass prouction for 130-nm node and future application for high transmission using ZrSi-based attenuated phase-shift mask in ArF lithography Ii,T., Saga,T., Hattori,Y., Ohshima,T., Otaki,M., Iwakata,M., Haraguchi,T., Kanayama,K., Yamazaki,T., Fukuhara,N., … SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12