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Reticle defect printability for sub-0.3k1 chromeless phase lithography (CPL) technology

著者名:
Hsu, S. ( ASML MaskTools, Inc. (USA) )
Van Den Broeke, D.J.
Shi, X.
Chen, J.F.
Knose, W.T.
Corcoran, N.P.
Vedula, S. ( KLA-Tencor Corp.(USA) )
MacNaughton, C.W.
Richie, M.
さらに 4 件
掲載資料名:
Photomask and Next-Generation Lithography Mask Technology IX
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
4754
発行年:
2002
開始ページ:
373
終了ページ:
383
総ページ数:
11
出版情報:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819445179 [0819445177]
言語:
英語
請求記号:
P63600/4754
資料種別:
国際会議録

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