Mask design optimization for 70-nm technology node using chromeless phase lithography (CPL) based on 100% transmission phase-shifting mask
- 著者名:
Chen, J.F. ( ASML MaskTools (USA) ) Van Den Broeke, D.J. Hsu, M. Laidig, T.L. Wampler, K.E. Shi, X. Hsu, S. Shafer, T. - 掲載資料名:
- Photomask and Next-Generation Lithography Mask Technology IX
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 4754
- 発行年:
- 2002
- 開始ページ:
- 361
- 終了ページ:
- 372
- 総ページ数:
- 12
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819445179 [0819445177]
- 言語:
- 英語
- 請求記号:
- P63600/4754
- 資料種別:
- 国際会議録
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