In-situ x-ray reflectivity measurement of the interface roughness of tantalum pentoxide thin film during rf magnetron sputtering deposition

In-situ x-ray reflectivity measurement of the interface roughness of tantalum pentoxide thin film during rf magnetron sputtering deposition

著者名:

Lee, C.-H ( National Tsing Hua Univ. (Taiwan) )
Huang, T.-W
Lee, H.-Y. ( Synchrotron Radiation Research Ctr. (Taiwan) )
Hsieh, Y.-W.

掲載資料名:

Nondestructive Evaluation and Reliability of Micro- and Nanomaterial Systems

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4703

発行年:

2002

開始ページ:

37

終了ページ:

45

総ページ数:

9

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819444516 [0819444510]

言語:

英語

請求記号:

P63600/4703

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00012538
シリーズID:	PA00000029
会議名:	Smart Structures : Nondestructive evaluation and reliability of micro- and nanomaterial systems
回次:	2002
会議開催地:	Newport Beach, USA
会議開催年:	2002.03.18-2002.03.19

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