Simulation and characterization of silicon oxynitrofluoride films as a phase-shift mask material for 157-nm optical lithography

Simulation and characterization of silicon oxynitrofluoride films as a phase-shift mask material for 157-nm optical lithography

著者名:

Kim, S. ( Korea Advanced Institute of Science and Technology )
Choi, E.
Kim, H. ( Samsung Electronics Co., Ltd. (Korea) )
Kim, J.
No, K. ( Korea Advanced Institute of Science and Technology )

掲載資料名:

Optical Microlithography XV

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4691

発行年:

2002

巻:

Part Two

開始ページ:

1696

終了ページ:

1702

総ページ数:

7

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819444370 [0819444375]

言語:

英語

請求記号:

P63600/4691

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00012526
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Optical microlithography
回次:	2002 : 15th
会議開催地:	Santa Clara, CA, USA
会議開催年:	2002.03.05-2002.03.08

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2 国際会議録 Potentialities of sub-100-nm optical lithography of alternating and phase-edge phase-shift mask for ArF lithography Koo,S.-S., Kim,H.-B., Yune,H.-S., Hong,J.-S., Paek,S.-W., Eom,T.-S., Ahn,C.-N., Ham,Y.-M., Baik,K.-H., Lee,K.-Y., … SPIE-The International Society for Optical Engineering	8 国際会議録 Attenuating phase-shifting mask at 157 nm Liberman, V., Rothschild, M., Spector, S.J., Krohn, K.E., Cann, S.C., Hien, S. SPIE-The International Society for Optical Engineering
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