Aberration determination in early 157-nm exposure system
- 著者名:
Smith, B.W. ( Rochester Institute of Technology (USA) ) Conley, W. ( International SEMATECH (USA) ) Garza, C.M. ( Motorola (USA) ) Meute, J. ( International SEMATECH (USA) ) Miller, D.A. ( International SEMATECH (USA) ) Rich, G.K. Graffenberg, V. Dean, K.R. Patel, S. Ford, A. Foster, J. ( ASML (USA) ) Moers, M.H. ( ASML (Netherlands) ) Cummings, K.D. Webb, J.E. ( Corning Tropel Corp. (USA) ) Dewa, P.G. Zerrade, A. ( DuPont Photomasks, Inc. (USA) ) McDonald, S.S. Hughes, G.P. Dirksen, P. ( Philips Research Labs. (Belgium) ) - 掲載資料名:
- Optical Microlithography XV
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 4691
- 発行年:
- 2002
- 巻:
- Part Two
- 開始ページ:
- 1635
- 終了ページ:
- 1643
- 総ページ数:
- 9
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819444370 [0819444375]
- 言語:
- 英語
- 請求記号:
- P63600/4691
- 資料種別:
- 国際会議録
類似資料:
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |