Spherical aberration measurement and in-situ correction

Spherical aberration measurement and in-situ correction

著者名:

Acheta, A. ( Advanced Micro Devices, Inc. (USA) )
Kye, J.
Levinson, H.J.

掲載資料名:

Optical Microlithography XV

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4691

発行年:

2002

巻:

Part Two

開始ページ:

1474

終了ページ:

1479

総ページ数:

6

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819444370 [0819444375]

言語:

英語

請求記号:

P63600/4691

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00012526
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Optical microlithography
回次:	2002 : 15th
会議開催地:	Santa Clara, CA, USA
会議開催年:	2002.03.05-2002.03.08

類似資料:

1 国際会議録 Electrical linewidth measurement for next-generation lithography Kye,J., Levinson,H.J. SPIE-The International Society for Optical Engineering	7 国際会議録 Characterization of line-edge roughness in photoresist using an image fading technique Pawloski, A.R., Acheta, A., Lalovic, I., Fontaine, B.M.L., Levinson, H.J. SPIE - The International Society of Optical Engineering
2 国際会議録 Linewidth asymmetry study to predict aberration in lithographic lenses Kye,J., Dusa,M.V., Levinson,H.J. SPIE-The International Society for Optical Engineering	8 国際会議録 Mask topography eftect with polarization at hyper NA [6154-171] Yamamoto, N., Kye, J., Levinson, H. J. SPIE - The International Society of Optical Engineering
3 国際会議録 Polarization aberration analysis using Pauli-Zernike representation N. Yamamoto, J. Kye, H. J. Levinson SPIE - The International Society of Optical Engineering	9 国際会議録 Lithography: a look at what is ahead Levinson,H.J. SPIE-The International Society for Optical Engineering
4 国際会議録 Analysis of focus errors in lithography using phase-shift monitors La Fontaine, B., Dusa, M.V., Krist, J., Acheta, A., Kye, J., Levinson, H.J., Luijten, C., Sager, C.B., Thomas, J., van … SPIE-The International Society for Optical Engineering	10 国際会議録 Metrology requirements for lithography's next wave Levinson, H.J. SPIE - The International Society of Optical Engineering
5 国際会議録 Image-blur tolerances for 65-nm and 45-nm node IC manufacturing Lalovic, I., Kroyan, A., Kye, J., Liu, H.-Y., Levinson, H.J. SPIE-The International Society for Optical Engineering	11 国際会議録 Spherical aberration correction for optical tweezers Arlt, J., Wilson, L., Theofanidou, E., Hossack, W.J. SPIE - The International Society of Optical Engineering
6 国際会議録 Polarization aberration analysis in optical lithography systems [6154-14] Kye, J., Mclntyre, G., Norihiro, Y, Levinson, J. SPIE - The International Society of Optical Engineering	12 国際会議録 Study of the influence of substrate topography on the focusing performance of advanced lithography scanners Fontaine, B.M.L., Hauschild, J., Dusa, M.V., Acheta, A., Apelgren, E.M., Boonman, M., Krist, J., Khathuria, A., … SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12