Model-based OPC for 0.13-μm contacts using 248-nm Att PSM
- 著者名:
Shin, J.-J. ( Taiwan Semiconductor Manufacturing Co., Ltd. ) Wu, T.C. Chen, C.-K. Liu, R.-G. Ku, Y.C. Lin, B.J. - 掲載資料名:
- Optical Microlithography XV
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 4691
- 発行年:
- 2002
- 巻:
- Part Two
- 開始ページ:
- 1296
- 終了ページ:
- 1307
- 総ページ数:
- 12
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819444370 [0819444375]
- 言語:
- 英語
- 請求記号:
- P63600/4691
- 資料種別:
- 国際会議録
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