Optical lithography simulation considering impact of mask errors

Optical lithography simulation considering impact of mask errors

著者名:

Kim, H.-B. ( Hynix Semiconductor Inc. (Korea) )
Ma, W.-K.
Ahn, C.-N.
Shin, K.-S.

掲載資料名:

Optical Microlithography XV

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4691

発行年:

2002

巻:

Part Two

開始ページ:

1278

終了ページ:

1286

総ページ数:

9

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819444370 [0819444375]

言語:

英語

請求記号:

P63600/4691

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00012526
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Optical microlithography
回次:	2002 : 15th
会議開催地:	Santa Clara, CA, USA
会議開催年:	2002.03.05-2002.03.08

類似資料:

1 国際会議録 Mask critical dimension error on optical lithography Eom,T.-S., Koo,S.-S., Paek,S.-W., Kim,H.-B., Ahn,C.-N., Baik,K.-H. SPIE - The International Society for Optical Engineering	7 国際会議録 Comparative study of chromeless and attenuated phase shift mask for 0.3-k1 ArF lithography of DRAM Eom, T.-S., Lim, C.-M., Kim, S.-M., Kim, H.-B., Oh, S.-Y., Ma, W.-K., Moon, S.-C., Shin, K.S. SPIE-The International Society for Optical Engineering
2 国際会議録 Quantitative analysis of mask error effect on wafer CD variation in ArF lithography Kim,S.-J., Koo,S.-S., Kim,S.-M., Ahn,C.-N., Ham,Y.-M., Shin,K.-S. SPIE-The International Society for Optical Engineering	8 国際会議録 0.33-k1 ArF lithography for 100-nm DRAM Bok, C.K., Kim, S.-K., Kim, H.-B., Oh, J.-S., Ahn, C.-N., Shin, K.-S. SPIE-The International Society for Optical Engineering
3 国際会議録 Double-exposure strategy using OPC and simulation and the performance on wafer with sub-0.10-μm design rule in ArF lithography Oh, S.-Y., Kim, W.-H., Yune, H.-S., Kim, H.-B., Kim, S.-M., Ahn, C.-N., Shin, K.-S. SPIE-The International Society for Optical Engineering	9 国際会議録 Comparison study on mask error factor in 100-nm ArF and KrF lithography Eom,T.-S., Hyun,Y.-S., Kim,C.-K., Bok,C.-K., Shin,K.-S. SPIE-The International Society for Optical Engineering
4 国際会議録 Application of full-chip level optical proximity correction to memory device with sub-0.10-μm design rule and ArF lithography Yune,H.-S., Kim,H.-B., Kim,W.-H., Ahn,C.-N., Ham,Y.-M., Shin,K.-S. SPIE-The International Society for Optical Engineering	10 国際会議録 Comparison study of mask error effects for various mask-making processes Eom,T.-S., Hur,I.-B., Koo,Y.-M., Baik,K.-H., Choi,I.-H., Kim,D.Y., Shin,C. SPIE - The International Society for Optical Engineering
5 国際会議録 Potentialities of sub-100-nm optical lithography of alternating and phase-edge phase-shift mask for ArF lithography Koo,S.-S., Kim,H.-B., Yune,H.-S., Hong,J.-S., Paek,S.-W., Eom,T.-S., Ahn,C.-N., Ham,Y.-M., Baik,K.-H., Lee,K.-Y., … SPIE-The International Society for Optical Engineering	11 国際会議録 Validation of repair process for DUV attenuated phase-shift mask Paek,S.W., Kim,H.-B., Ahn,C.-N., Koo,Y.-M., Baik,K.-H. SPIE - The International Society for Optical Engineering
6 国際会議録 Feasibility study on the ArF attenuated phase-shift mask for 100-nm node lithography Koo,S.-S., Kim,S.-J., Paek,S.-W., Ahn,C.-N., Ham,Y.-M., Shin,K.-S. SPIE-The International Society for Optical Engineering	12 国際会議録 Study of optical proximity effects using off-axis illumination with attenuated phase shift mask C.-N. Ahn, K.-H. Baik, Y.-S. Lee, H.-E. Kim, I.-B. Hur Society of Photo-optical Instrumentation Engineers

1

2

3

4

5

6

7

8

9

10

11

12