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193-nm lithography and resist reflow for the BEOL

著者名:
DellaGuardia, R. ( IBM Corp. (USA) )  
掲載資料名:
Optical Microlithography XV
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
4691
発行年:
2002
巻:
Part Two
開始ページ:
853
終了ページ:
860
総ページ数:
8
出版情報:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819444370 [0819444375]
言語:
英語
請求記号:
P63600/4691
資料種別:
国際会議録

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