Analysis of wafer flatness for CD control in photolithography

Analysis of wafer flatness for CD control in photolithography

著者名:

Fujisawa, T. ( Toshiba Corp. (Japan) )

Okumura, K. ( Univ. of Tokyo (Japan) )

Hagiwara, T. ( Nikon Corp. (Japan) )

Oka, S. ( Shin-Etsu Handotai Co., Ltd. (Japan) )

さらに 4 件

掲載資料名:

Optical Microlithography XV

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4691

発行年:

2002

巻:

Part Two

開始ページ:

802

終了ページ:

809

総ページ数:

8

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819444370 [0819444375]

言語:

英語

請求記号:

P63600/4691

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00012526
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Optical microlithography
回次:	2002 : 15th
会議開催地:	Santa Clara, CA, USA
会議開催年:	2002.03.05-2002.03.08

類似資料:

1 国際会議録 Desirable wafer edge flatness for CD control in photolithography Fujisawa, T., Inoue, S., Hagiwara, T., Kennichi, K., Kobayashi, M., Okumura, K. SPIE-The International Society for Optical Engineering	7 国際会議録 Self-calibration of wafer scanners using an aerial image sensor Hagiwara, T., Hamatani, M., Kondo, N., Suzuki, K., Nishinaga, H., Inoue, J., Kaneko, K., Higashibata, S. SPIE-The International Society for Optical Engineering
2 国際会議録 CD control with effective exposure dose monitor technique in photolithography Asano, M., Izuha, K., Fujisawa, T., Inoue, S. SPIE-The International Society for Optical Engineering	8 国際会議録 Novel methodology for 130-nm DRAM cell mask size optimization Kanemitsu,H., Nagai,K., Asano,M., Sutani,T. SPIE - The International Society for Optical Engineering
3 国際会議録 Run-to-run CD error analysis and control monitoring of effective dose and focus Asano, M., Fujisawa, T., Izuha, K., Inoue, S. SPIE-The International Society for Optical Engineering	9 国際会議録 Aerial image sensor for self-calibration of wafer steppers Hagiwara,T., Mizutani,H., Kondo,N., Inoue,J., Kaneko,K., Higashibata,S. SPIE-The International Society for Optical Engineering
4 国際会議録 Desirable reticle flatness from focus deviation standpoint in optical lithography Inoue, S., Itoh, M., Asano, M., Okumura, K., Hagiwara, T., Moriya, J. SPIE-The International Society for Optical Engineering	10 国際会議録 'Radical-Controlled' Oxidative Polymerization of Phenols Higashimura, H., Fujisawa, K., Moro-oka, Y., Kubota, M., Shiga, A., Uyama, H., Kobayashi, S. Elsevier
5 国際会議録 New concept of specification for mask flatness Itoh, M., Inoue, S., Okumura, K., Hagiwara, T., Moriya, J. SPIE-The International Society for Optical Engineering	11 国際会議録 Influence of pellicle mounting to predicted mask flatness Itoh, M., Inoue, S., Hagiwara, T., Kondo, N. SPIE - The International Society of Optical Engineering
6 国際会議録 Novel in-situ focus monitor technology in attenuated PSM under actual illumination condition Izuha, K., Asano, M., Fujisawa, T., Inoue, S. SPIE-The International Society for Optical Engineering	12 国際会議録 Impact of mask CD error on wafer CD error at low-k1 photolithography Kim, B. -G., Choi, S. -W., Choi, J. -H., Chun, C. -U., Yoon, H. -S., Sohn, J. -M. SPIE - The International Society of Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12