Attainable road to the lower-k1 extension using high-transmittance attenuated phase-shifting mask in the KrF lithography world
- 著者名:
Kim, I.-S. ( Samsung Electronics Co., Ltd. (Korea) ) Jung, S.-G. Kim, H.-D. Yeo, G.-S. Shin, I.-K. Lee, J.-H. Cho, H.-K. Moon, J.-T. - 掲載資料名:
- Optical Microlithography XV
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 4691
- 発行年:
- 2002
- 巻:
- Part One
- 開始ページ:
- 466
- 終了ページ:
- 475
- 総ページ数:
- 10
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819444370 [0819444375]
- 言語:
- 英語
- 請求記号:
- P63600/4691
- 資料種別:
- 国際会議録
類似資料:
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
3
国際会議録
Comparative study of chromeless and attenuated phase shift mask for 0.3-k1 ArF lithography of DRAM
SPIE-The International Society for Optical Engineering |
9
国際会議録
Selection of attenuated phase shift mask compatible contact hole resists for KrF optical lithography
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
5
国際会議録
Sub-120-nm technology compatibility of attenuated phase-shift mask in KrF and ArF lithography
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |