Minimization of image placement errors in chromeless phase-shift mask lithography
- 著者名:
Fritze, M. ( MIT Lincoln Lab. (USA) ) Tyrrell, B. Cann, S.G. Carney, C. ( Arch Chemicals, Inc. (USA) ) Blachowicz, B.A. Brzozowy, D. Kocab, T. Bowdoin, S. ( Schlumberger Ltd. (USA) ) Rhyins, P.D. ( Photronics Inc. (USA) ) Progler, C.J. Martin, P. - 掲載資料名:
- Optical Microlithography XV
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 4691
- 発行年:
- 2002
- 巻:
- Part One
- 開始ページ:
- 426
- 終了ページ:
- 436
- 総ページ数:
- 11
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819444370 [0819444375]
- 言語:
- 英語
- 請求記号:
- P63600/4691
- 資料種別:
- 国際会議録
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