Universal process modeling with VTRE for OPC

Universal process modeling with VTRE for OPC

著者名:

Granik, Y. ( Mentor Graphics Corp. (USA) )
Cobb, N.
Do, T.

掲載資料名:

Optical Microlithography XV

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4691

発行年:

2002

巻:

Part One

開始ページ:

377

終了ページ:

394

総ページ数:

18

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819444370 [0819444375]

言語:

英語

請求記号:

P63600/4691

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00012525
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Optical microlithography
回次:	2002 : 15th
会議開催地:	Santa Clara, CA, USA
会議開催年:	2002.03.05-2002.03.08

類似資料:

1 国際会議録 Toward standard process models for OPC Y. Granik, D. Medvedev, N. Cobb SPIE - The International Society of Optical Engineering	7 国際会議録 New concepts in OPC Cobb, N., Granik, Y. SPIE - The International Society of Optical Engineering
2 国際会議録 New process models for OPC at sub-90-nm nodes Granik, Y., Cobb, N.B. SPIE-The International Society for Optical Engineering	8 国際会議録 Model-based OPC considering process window aspects: a study Schulze, S.F., Park, O., Zimmermann, R., Chen, M.-J., LaCour, P., Sahouria, E.Y., Granik, Y., Cobb, N. SPIE-The International Society for Optical Engineering
3 国際会議録 Model-based OPC using the MEEF matrix Cobb, N,B,, Granik, Y. SPIE-The International Society for Optical Engineering	9 国際会議録 Calibration of compact OPC models using SEM contours [5992-68] Granik, Y. SPIE - The International Society of Optical Engineering
4 国際会議録 OPC methods to improve image slope and process window Cobb, N.B., Granik, Y. SPIE-The International Society for Optical Engineering	10 国際会議録 Failure prediction across process window for robust OPC Shang, S.D., Granik, Y., Cobb, N.B., Maurer, W., Cui, Y., Liebmann, L.W., Oberschmidt, J.M., Singh, R.N., Vampatella, … SPIE-The International Society for Optical Engineering
5 国際会議録 Using OPC to optimize for image slope and improve process window Cobb, N.B., Granik, Y. SPIE-The International Society for Optical Engineering	11 国際会議録 Failure prediction across process window for robust OPC Shang, S.D., Granik, Y., Cobb, N.B., Maurer, W., Cui, Y., Liebmann, L.W., Oberschmidt, J.M., Singh, R.N., Vampatella, … SPIE-The International Society for Optical Engineering
6 国際会議録 Application of CMO resist model to OPC and verification [6154-132] Granik, Y., Cobb, N., Medvedev, D. SPIE - The International Society of Optical Engineering	12 国際会議録 MEEF as a matrix Granik,Y., Cobb,N. SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12